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filingDate 1994-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05a5e6de7b86a470ad902a93d4c2b6c0
publicationDate 1995-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0651070-A1
titleOfInvention Methods for removing contaminants from vacuum chamber surfaces
abstract The disclosure relates to in-situ cleaning of unwanted films and particles of a material from a surface situated inside a vacuum chamber (12) by equipping such chamber with a means (30,32) of generating a magnetic field having a magnetic flux density of at least 25 gauss, flowing at least one gas into the chamber through an inlet port (20) and igniting a plasma by an RF generator (18) to produce plasma ions of at least one gas, switching on the magnetic field generating means (30,32) to a magnetic flux density of no less than 25 gauss and, reducing the magnetic field by a flux density of at least 10 gauss such that the unwanted films and particles of the material are dislodged from the surface by the sudden change in the magnetic flux density at the magnetic field.
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