| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-55 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-734
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-734
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D309-12 |
| filingDate |
1994-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02c604b946ce5a7b5bd516a11a3b4d31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae3970fe8a01a535b53c8936ee00ab01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d897073f5d65315a098d0fef996ecea2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_082ef80ac91a9d8bb6e7bb77f3a15baf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b635b1b8f8caa7d07bcd3f47246a06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a34e7eb589f810dd281c60b5bfc52fe8 |
| publicationDate |
1995-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0646568-A2 |
| titleOfInvention |
Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same |
| abstract |
Disclosed are novel tert-butyl 4,4-bis(4'-hydroxyphenyl)pentanoate derivatives represented by the following general formula (I);n nwherein R 1 represents a protective group which can be readily eliminated under an acidic condition, and R 2 represents a hydrogen atom, a lower alkyl group or a lower alkoxy group: and high energy radiation-responsive positive resist materials using said novel derivatives as dissolution inhibitors. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1411390-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1411390-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1053985-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1053986-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6448420-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6413695-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6638684-B2 |
| priorityDate |
1993-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |