| abstract |
Herein is disclosed a resist which comprises a water repellent compound having a functional group of which water repellent ability disappears through a nucleophilic substitution reaction with alkali or at least two functional groups, in one molecule, of which water repellent ability disappears through a reaction with alkali, and a permeability-variable composition of which alkaline solution-permeability is changed by radiation exposure or radiation exposure and baking after radiation exposure, said resist being excellent in sensitivity to UV light, electron beam, X-ray and other radiations, high in resolution capability and developable with aqueous alkaline solution; as well as a pattern forming method using said resist. |