| abstract |
Photopolymerizable coating and recording materials, such as photoresist transfer films and photoresist materials with at least one photopolymerizable olefinic compound, contain, as an activated photoinitiator system, in addition to a carbonyl compound which forms radicals upon exposure to actinic light, such as benzophenone or benzophenone derivatives, and at least two dichloromethyl compounds bonded to the benzene nucleus, such as dichloromethyl groups (dichloromethyl) benzene or 2,5-dichloro-1,4-bis (dichloromethyl) benzene and preferably additionally an indicator dye which changes color when acid is added. They show improved curing through UV exposure in the usual time periods and uncritical work with regard to the permissible washout times when washing out unexposed parts with solvents. |