| abstract |
Photoresists are said to be particularly suitable for high-temperature use. The new positive resists based on polybenzoxazole precursors and diazoquinones should not only be highly heat-resistant, but should also be inexpensive to produce and have a high resolving power.n n n According to the invention, the polybenzoxazole precursors are hydroxypolyamides of the following structure: where R, R *, R₁ and R are aromatic groups, and the following applies to n 1 and n 2: n₁ and n₂ = 1 to 100, with the proviso: R ≠ R * and / or R₁ ≠ R .n n n Chips, bipolar gate arrays and memories |