| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-05 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76235 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate |
1987-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80a9dcd8843c919784e9cd8cd0e9340a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_992b90e6f34de8fe396f28ef06ea404c |
| publicationDate |
1988-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0252450-A2 |
| titleOfInvention |
Integrated circuit isolation process |
| abstract |
A multiple recess isolation technology avoids stress induced defects while providing a substantially planar surface. A silicon substrate (10) is patterned and etched, creating active moat regions (18) and recesses (20a-b and 21a-b). The recesses are filled with oxide by growing a field oxide (40) in wide recessed regions (21) using a LOCOS process, while depositing a planarization field oxide (44) in narrow recessed regions (20). After etching the structure to obtain a planar surface, standard procedures are used to fabricate the active devices. The process uses a single photolithographic masking step and results in only a very small loss of the width electrically active regions. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-4340226-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5807784-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5290718-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19603108-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19603108-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6008526-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0330989-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-4340226-A1 |
| priorityDate |
1986-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |