http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0249457-A2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
filingDate 1987-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27f8b301f3479c283903d7821f6b2deb
publicationDate 1987-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0249457-A2
titleOfInvention Method for formation of patterns
abstract Disclosed is a method for formation of a resist pattern used in the photo lithography steps for preparing semi-conductor devices and more particularly, a method for formation of a superfine resist pattern which comprises selectively exposing a resist surface of a photosensitive high molecular film to light to modify the exposed area to a hydrophilic property, chemically adsorbing a Si-containing reagent selectively to the modified area and then subjecting to O₂ RIE using the Si-adsorbed film as a mask. The method is also characterized by enabling to formation of a finer pattern formation using a monomolecular film or monomolecular built-up film formed by the LB method or the chemical adsorption method in place of the resist described above.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0291670-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0445534-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5114737-A
priorityDate 1986-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0186798-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0184567-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0248779-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0161476-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0198280-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4539061-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0136130-A2
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408758511
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452209933
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127941613
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129456876
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559516
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4663752
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID595164
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128380666
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22385448
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458433298
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID54183197
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID574953
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128032311
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5280451
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414673253
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66666
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419584876
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416018072
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129303129
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457277700
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128899499
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127935122
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69395
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4268635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID117769
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21225906
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID79102
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128418210
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128666970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450513694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID94242
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128231650
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129170894
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID54488291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID185912
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426025563
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24811
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411300951
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127562728
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID129841686

Total number of triples: 67.