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filingDate 1987-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d90f1d355d997a6494265af1e3c119aa
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publicationDate 1987-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0241718-A2
titleOfInvention Process for removing contaminant from holes
abstract Contaminant is removed from holes by etching in a gaseous plasma by first removing contaminant from the vicinity of the edges of the hole. Next, a mask is provided in the vicinity of the edges to prevent etching by contacting with a gaseous plasma which is different from the gaseous plasma employed in the first etching step. The holes are then etched in a gaseous plasma to remove contaminant from the interior of the holes in the vicinity of the center of the holes, whereby the mask protects the edges from being etched.
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priorityDate 1986-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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