| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate |
1986-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52757cf73ee586ceacb86dc5183ed142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_584c516332a735c824f8434790f7ed71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64bbab3e924f9ebc6791eb4840e44598
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_119e5c192baa80938969a90fed62f404 |
| publicationDate |
1987-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0219697-A2 |
| titleOfInvention |
Laser induced halogen gas etching of metal substrates |
| abstract |
A process for radiation induced dry etching a metallised (e.g. copper) substrate is disclosed wherein the substrate is exposed to a patterned beam of laser radiation in a halogen gas atmosphere which is reactive with the substrate to form a metal halide salt reaction product to accelerate the formation of the metal halide salt without its substantial removal from the substrate. The metal halide salt is removed from the substrate by contact of the substrate with a solvent for the metal halide salt. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0433983-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0436812-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0433983-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5318662-A |
| priorityDate |
1985-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |