http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0188148-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c23a1323673a16fb6f1c1f6df4fe292b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0783 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-092 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 1985-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8b21ac5df6940fee95d67090de60ada |
| publicationDate | 1986-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0188148-A1 |
| titleOfInvention | Photolythographic process for thick film paste deposited on a substrate |
| abstract | The invention relates to electrical circuits produced by depositing a thick layer of conductive, resistive or dielectric paste on a flat substrate.n n n The thick layers are applied using a squeegee or by screen printing. In the latter case, the resolution of the patterns is at best 200 microns, limit of the meshes of screen printing screens. In order to produce finer patterns, the thick layer (5) is dried and then masked by means of a photoresist, the patterns (7) of which can have a resolution of 50 microns, with a space of 50 microns. The thick layer (5) is then etched, in its parts not protected by the photoresist mask (7), by means of a mixture of organic solvents, which has a differential solubility vis-à-vis the thick layer (5) and photoresist (7).n n n Application to high density and high definition hybrid circuits, in conjunction with integrated circuits of the VLSi type. |
| priorityDate | 1984-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.