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filingDate 1983-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3584a890139de770d3d7bbfeccfbcc43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_275100caa3872a60895daae8351d7583
publicationDate 1984-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0106977-A2
titleOfInvention Method and apparatus for electrochemically treating a substrate
abstract A laser enhanced electroplating system or etching system or conventional electroplating or etching system includes a continuous electrochemical processing system with a sheet of material to be treated electrochemically passed from a supply roller to a plating bath and out over an exit roller with the plating system under automatic control. A rinse-tank is also proved in series with the plating tank. The sheet to be treated electrochemically is coated in tank (21) with a protective film which prevents electrochemical action from occuring where it is present, but which sheet can be removed in a predetermined location. The protective film is removed where desired to provide a mask by means of a laser (27) which is scanned under automatic control. Then the plating or etching operation occurs through the openings in the mask. A rinse-tank contains a solvent capable of removing the mask from the sheet subsequent to the plating or etching operation. An array of lasers can be employed. An array of lasers can be multiplexed, synchronously activated or pulsed. The electrochemical operation can be performed with the concomitant application of energy from the laser in order to enhance the chemical action in areas from which the masking (protective) film has been removed. The laser can be scanned by means of a mirror, which oscillates or can be fixed. The masking material is composed of an organic material such as glycol phthalate, paraffin, photoresist, gelatin, etc.
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priorityDate 1982-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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