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filingDate 1981-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1985-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1985-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-3127765-C2
titleOfInvention Process for preventing post-etching corrosion of layers of aluminum
abstract Method of preventing post-etching corrosion of layers of aluminum or aluminum alloys which have been etched using chlorinated plasma; the etched layer is exposed to a fluorinated plasma.
priorityDate 1980-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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