http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-3109809-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1981-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9712feda1e14c15bbc6b48478e8f4a48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c60c0effc12e86f56d0fdf8a91ec0a9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f955ea4cc924a0c696e49b824d7152a8 |
| publicationDate | 1982-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-3109809-A1 |
| titleOfInvention | "METHOD FOR PRODUCING RESIST STRUCTURES" |
| abstract | The invention relates to a process for producing resist structures based on negative resists by means of shortwave UV radiation, the object being the development of a process of this type in such a way that resist structures having steep flanks, coupled with high contrast and good wet and dry etching resistance, can be produced. For this purpose, the invention provides the use of copolymers or terpolymers of the following structure as the resist material: <IMAGE> where n + m = 1, and the radicals R, X, Y and Z are defined as follows: R = H, halogen (F, Cl, Br, I), -CH2-halogen or -CH2-CH2-halogen (the radicals R being identical or different); X = H, CH3 or C2H5; Y = H, Cl or Br, it being possible for the radicals Y to be identical or different; and Z = O or S. The process according to the invention is particularly suitable for producing resist structures on profiled wafers. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5395863-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2264118-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2264118-A |
| priorityDate | 1981-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.