http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2600207-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6166fd95a23a202956be801ffaff753f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-705 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-705 |
| filingDate | 1976-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0dec83e9714df509b5df06fe721126a9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df3df17ff7c335219d95fe0713cc349 |
| publicationDate | 1977-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-2600207-A1 |
| titleOfInvention | PROCESS FOR MANUFACTURING RELEASE PRODUCTS OF SPECIFIED CONFIGURATION |
| abstract | Relief patterns on materials sensitive to electromagnetic and corpuscular radiation are produced by forming a metal layer on a substrate, followed by a layer of an inorganic material capable of chemically reacting with the metal layer with the formation of reaction products having different physical and chemical properties than the inorganic material and for metal. Image of a pattern is projected onto the coated surface and some parts of the coating and removed. This method is improved in that between the metal layer and the inorganic material layer on intermediate layer is introduced consisting of a material which is inert with respect to the metal and the inorganic material unless exposed to an electromagnetic or corpuscular radiation. The thickness of this intermediate layer is sufficient to prevent any reaction between the metal and the inorganic material in the absence of any activity radiation. After the projection of an image the unwanted parts of this intermediate layer are removed along with the unwanted parts of the other layers. The intermediate layer is pref. formed by contacting the metal surface with an atmos. contg. O2 and/or Fe, Cl2, Br2, I2, S, Se or Te. Alternatively, the intermediate layer can be formed by chemical deposition from a soln. or a melt. The removal of unwanted parts of the intermediate layer can be carried out mechanically or by chemical etching or by sublimation at an elevated temp. During the irradiation an electric field can be applied. Objects with a relief surface pattern can be produced, such as holograms, diffraction gratings, polarisers for electromagnetic waves, photo stencils, elements of microcircuits, printed circuit plates, information storage cells, typographic plates, etc. Electromagnetic or corpuscular radiation having a lower intensity than in the conventional process can be used; red and mean infrared light can be employed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19741998-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2757830-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-4024748-C1 |
| priorityDate | 1976-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.