http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19947932-C1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3438 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 |
| filingDate | 1999-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe7dd152f03b967de6ca3ed675e899de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3939ea28ee12a65b26d3fa5de7702f3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8d5b038f7c5cd5e4be3264870c6ef93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e03adf20017894ae3b880de5100b0089 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a33994e077b27cc31b0e70f5ddbeee5 |
| publicationDate | 2001-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-19947932-C1 |
| titleOfInvention | Device for magnetron sputtering |
| abstract | The invention relates to a device for magnetron sputtering, which is essentially arranged on a vacuum flange that can be fastened in the chamber wall of a vacuum chamber. The device consists of at least one target and a counterelectrode, both of which are arranged within the vacuum chamber, and outside of the vacuum chamber at least one magnet system arranged behind the target and a power supply device. Between the target (1) and the counter electrode (10) there is an outer plasma electrode (9) which can be connected to a first optional potential, the counter electrode (10) can be connected to a second optional potential, in the center of the target ( 1) an inner plasma electrode (8) is arranged, which can be connected to a third optional potential, and on the vacuum flange (6) there is a shield electrode (11) which the target (1), the counter electrode (10), the outer plasma electrode (9) and the inner plasma electrode (8) and which can be connected to a fourth optional potential. Gas outlet openings (12, 13) are provided on the inner plasma electrode (8) and / or the outer plasma electrode (9). At the inner plasma electrode (8) and / or the outer plasma electrode (9), plasma screens (14, 15) cover the respective columns (35, 34) to the target. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011091662-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102011115145-A1 |
| priorityDate | 1999-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.