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filingDate 2004-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2008-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bb7034346b94fd41604bfd247b36dd9
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publicationDate 2008-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-112004000057-B4
titleOfInvention Plasma treatment apparatus and plasma treatment method
abstract The plasma treatment apparatusnfor activating a plasma generation gas by a dischargenand sprayingnan activated plasma generation gas on an object (5),nwherein the plasma treatment apparatus is a reaction vessel (R), thenis formed by an insulating part (1), with several feedthroughs (2),neach of which has at its one end an inflow port (2a) for the plasma generation gasn(G) and at its oppositenEnd of an outflow opening (2b)nfor thenactivated plasma generating gas, electrodes (3, 4) for developingnthe discharge in each of the bushings (2), a gas supply meansn(9, 10, 11) arranged to generate the plasma generation gasn(G) in the reaction vessel (R) tonlead, and a unit (6) for applying voltage, thenis arranged to provide a voltage between the electrodes (3,n4) to apply in the bushingsn(2) to generate plasmas of the plasma generation gas, the insulating onenPart (1) is configured in the form of a plate and the electrodesn(3, 4) are embedded in the insulating part (1) so that positions of several ...
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priorityDate 2003-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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