http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102021131627-A1

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filingDate 2021-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99fec4472973434f5ad30a60a75d3b0d
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publicationDate 2022-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102021131627-A1
titleOfInvention FIN TRANSISTORS WITH SEMICONDUCTOR SPACERS
abstract From a general point of view, a transistor can include a fin having a proximal end and a distal end. The fin may include a dielectric portion extending longitudinally between the proximal end and the distal end and a semiconductor layer disposed on the dielectric portion. The semiconductor layer may extend longitudinally between the proximal end and the distal end. The transistor may further include a source region located at the proximal end of the fin and a drain region located at the distal end of the fin. The transistor may also include a gate dielectric layer disposed on a channel region of the semiconductor layer. The channel region may be located between the gate dielectric layer and the dielectric section. The channel region may extend longitudinally between the source region and the drain region. The transistor may further include a conductive gate electrode disposed on the gate dielectric layer.
priorityDate 2020-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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