http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102019111799-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3239ac6dd2f8d345586118a7ca507ada |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-023 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02047 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04R1-00 |
filingDate | 2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e1229b53a5c129a2d1926eaca5b102c |
publicationDate | 2020-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | DE-102019111799-A1 |
titleOfInvention | Method for manufacturing an electroacoustic resonator and electroacoustic resonator |
abstract | One method of manufacturing an electroacoustic resonator (113) comprises providing a workpiece that includes a layer of silicon (110) having first and second surfaces (111, 112). A layer stack (130) which comprises a piezoelectric layer (132) is arranged on the first surface and is configured to enable RF functionality. A plasma etching process is carried out on the second surface (112) in a separation line area (121) and in a local area (122) in order to separate part of the workpiece from another part and to form at least one local recess (140). The plasma etching process stops on a layer (131) of the layer stack (130). |
priorityDate | 2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.