http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102019111799-A1

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filingDate 2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e1229b53a5c129a2d1926eaca5b102c
publicationDate 2020-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102019111799-A1
titleOfInvention Method for manufacturing an electroacoustic resonator and electroacoustic resonator
abstract One method of manufacturing an electroacoustic resonator (113) comprises providing a workpiece that includes a layer of silicon (110) having first and second surfaces (111, 112). A layer stack (130) which comprises a piezoelectric layer (132) is arranged on the first surface and is configured to enable RF functionality. A plasma etching process is carried out on the second surface (112) in a separation line area (121) and in a local area (122) in order to separate part of the workpiece from another part and to form at least one local recess (140). The plasma etching process stops on a layer (131) of the layer stack (130).
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