http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014205001-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-1071
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-107
filingDate 2014-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a31e18cdd71e1b483e90778ad1666118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e56c5cdee56a5a073d160f56cb3cdc3
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publicationDate 2015-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102014205001-A1
titleOfInvention Process for the preparation of trichlorosilane
abstract The invention relates to a process for the preparation of TCS by reacting a reactant gas containing STC and hydrogen at a temperature of greater than or equal to 900 ° C, wherein a product gas containing TC S is formed, characterized in that during the reaction at least one carbon-containing compound present in the educt gas is, wherein a volume fraction of the carbonaceous compounds based on a standard volume flow of hydrogen 10 vol.-ppm to 10 vol .-%, wherein after condensation of silane in the product gas over a reaction of the educt gas containing STC and hydrogen without addition of a carbon-containing compound to the educt gas a maximum of 200 ppmw of additional organochlorosilanes are contained in the resulting product mixture.
priorityDate 2014-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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