http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102013114118-B4

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_57548e977691b443c1d38abe3acc65cd
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32027
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2013-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65bb5e78e4bc6db8125ebf2730a76828
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35899a080d25db1579bbfb26b99633ad
publicationDate 2018-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102013114118-B4
titleOfInvention The plasma processing apparatus
abstract A plasma processing apparatus (100) comprising: a vacuum chamber (202), a transport device for transporting a substrate (120) through a treatment area (110) in the vacuum chamber (202), an anode (108) within the treatment area (110) for providing a plasma in the treatment area (110); and • a treatment area limiting housing structure (112) electrically shielding the anode (108) from the vacuum chamber (202) and having at least one opening (112a, 112b), wherein the housing structure (112) and the transport device are arranged such in that the substrate (120) transported through the treatment area (110) can be transported through the at least one opening (112a, 112b) of the housing structure (112) into the treatment area (110) and / or out of the treatment area (110).
priorityDate 2013-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 26.