http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102011017583-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d38394d211ce1c910c2c1899c46bbd09 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-543 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-548 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3299 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 |
| filingDate | 2011-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31e1c2f57c6252ae96d855f861e06e63 |
| publicationDate | 2016-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102011017583-B4 |
| titleOfInvention | Method for determining process-significant data of a vacuum deposition process and its further processing in measurement or control processes |
| abstract | Method for determining process-significant data of a vacuum deposition process and its further processing in measurement or control processes, in which a substrate in a vacuum chamber by means of a material dissolved out of a target connected to a magnetron, applying a target voltage provided by a regulated voltage source between the target and a counter electrode and under the introduction of a process gas into the vacuum chamber is coated in a process space, wherein an optical emission spectrum is recorded and from intensities of spectral lines of the process involved in the coating process process materials, process-significant data of the vacuum deposition process for further processing in measuring or control processes are determined, characterized at least three intensities I 1 ... I 3 of a plurality of spectral lines (11 to 15) of at least two process materials are determined in situ from the optical emission spectrum (10) recorded in situ, that a first relative intensity R 1 is calculated from a pair of the intensities I 1 ... I 3 with a first mathematical combination, that a second relative intensity R 2 is calculated from another pair of the intensities I 1 ... I 3 with a second mathematical combination, and that from the first relative intensity R 1 and the second relative intensity R 2 with a third mathematical linkage, an intensity linkage IV is calculated as the process-significant datum. |
| priorityDate | 2011-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.