http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102006051766-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_69a4ae662cd6a46490ee45a70e85dc39
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
filingDate 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7a2b0317f7ea3937fd286047f06b7e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9588e156fa786257015e57bdd4990848
publicationDate 2008-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102006051766-A1
titleOfInvention Process for structuring a photoresist
abstract ThenThe present invention relates to a method of forming anstructured photoresist layer (21, 22) on a substrate (20).nIn this case, a substrate (20) is used, a photoresist layern(21, 22) applied to the substrate (20) and the photoresist layern(21, 22) selectively exposed, wherein a first acid (41) in an exposednArea (23) of the photoresist layer (21, 22) is formed. Byna first baking of the photoresist layer (21, 22) are acid catalyzedncaused chemical reactions, by which a solubility of thenexposed area (23) of the photoresist layer (21, 22)nbecomes. A second acidn(42) becomes selective in the exposed area (23) of the photoresist layern(21, 22) diffused. By a second baking of the photoresist layern(21, 22) are acid-catalyzedncause chemical reactions through which the solubilitynthe exposed area (23) of the photoresist layer (21, 22) onnbeing affected. For structuring, the photoresist layer (21,n22) developed with the help of a developer.
priorityDate 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6096484-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1306726-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19857094-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006046161-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004126715-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6767693-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10120660-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5324550-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003073039-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6884735-B1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2758875
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421170388
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74483
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421468351
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID587694
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397310
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11729320
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8165
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448674543
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419571081
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526573

Total number of triples: 36.