http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-209519581-U

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-32
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filingDate 2018-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a953ce29d738719ce4c5e93667ade153
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publicationDate 2019-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-209519581-U
titleOfInvention Denitration reaction of low temperature plasma device
abstract The utility model discloses a kind of denitration reaction of low temperature plasma device, the device be placed in deduster after, before desulfurization in flue.The a large amount of active particles being rich in low-temperature plasma body such as ion, electronics, the atom of excitation state and molecule and free radical etc., so that aoxidizing CO, NO, VOCs etc. for plasma technique provides condition.Low temperature plasma utilizes the effects of CO, NO, VOCs in these high energy electrons, free radical isoreactivity particle and flue gas, and the nitrogen in NO molecule is made to be oxidized to high-valence state nitrogen oxides (such as N 2 O 3 、N 2 O 5 ), it cooperates with desulfurizer by chemical absorbing and removes to realize.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113171673-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109351151-A
priorityDate 2018-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.