http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113171673-A

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filingDate 2021-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ba18dd0dfcfc54f5386a2d056bdce84
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publicationDate 2021-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113171673-A
titleOfInvention Ship exhaust gas treatment device based on plasma ionization
abstract The invention discloses a ship exhaust gas treatment device based on plasma ionization. It includes a high-voltage electrode that is located in the middle and is in the shape of a column. The high-voltage electrode is wrapped with an insulating material, and the insulating material is spirally wound with a ground electrode. Multiple layers are arranged at intervals in the gas direction, and each layer of plasma discharge electrodes includes a plurality of electrodes arranged in parallel at intervals and in parallel. The invention has the advantages of good ionization effect, high exhaust gas treatment efficiency and long service life, and is especially suitable for the application of ship exhaust gas treatment.
priorityDate 2021-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 32.