http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-203595821-U

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01V8-10
filingDate 2013-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6db41ca3a5595acfdb75aad6fb6b249
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publicationDate 2014-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-203595821-U
titleOfInvention Error correcting device and plasma equipment
abstract The utility model discloses an error correcting device and plasma equipment. The error correcting device comprises an error correcting sensor, a signal receiver and a cable coated by a protection layer. The error correcting sensor is connected with the signal receiver through the cable. The error correcting sensor includes a frame made of first anticorrosion material, and an infrared photosensitive lens fixed on the frame. The infrared photosensitive lens is coated by an anticorrosion layer made of second anticorrosion material. While in use, the signal receiver is arranged in a normal pressure environment, and the error correcting sensor is arranged in a vacuum ion environment, such that, as the frame and the infrared photosensitive lens of the error correcting sensor are made of the anticorrosion materials, the frame and the infrared lens are protected from being corroded by acid gas for plasma etching. Besides, for the signal receiver in the normal pressure environment, the internal circuit board is not influenced by plasma etching environment, and can be used for a long time. The plasma equipment using the aforementioned error correcting device has stable performance and long service life.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103592693-A
priorityDate 2013-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 23.