| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32972
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2020-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7139316adfd7ea92c7b7c43fbb268331
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f67da1d1acda15c869b1c557111f9374
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54da44db697352681932a12c04432018 |
| publicationDate |
2022-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114981932-A |
| titleOfInvention |
Plasma processing apparatus and plasma processing method |
| abstract |
The plasma processing apparatus according to the present invention includes: a processing chamber for performing plasma processing on a sample; a high-frequency power supply for supplying high-frequency power for generating plasma; and a sample stage on which the sample is placed. The plasma processing apparatus further includes a control device that measures the thickness of a protective film selectively formed on a desired material of the sample using interference light reflected from the sample by irradiating the sample with ultraviolet rays, or uses the interference light that is reflected from the sample by irradiating the sample with ultraviolet rays. The selectivity of the protective film is judged from the interference light reflected by the sample. |
| priorityDate |
2020-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |