http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114634429-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1071 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C303-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2022-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-114634429-B |
| titleOfInvention | Photosensitive diamine monomer and preparation method thereof, resin containing photosensitive diamine monomer, and photosensitive resin composition |
| abstract | The present application relates to the technical field of polymer materials, in particular to a photosensitive diamine monomer and a preparation method thereof, a resin containing the photosensitive diamine monomer, and a photosensitive resin composition. The present application provides a photosensitive diamine monomer, the structural formula of which is shown in formula (1). The preparation method of the photosensitive diamine monomer specifically comprises the following steps: preparation of primary products; preparation of secondary products; preparation of crude photosensitive diamine monomers; purification of crude photosensitive diamine monomers. The present application also provides a photosensitive diamine monomer-containing resin prepared by using the above photosensitive diamine monomer, and a photosensitive resin composition prepared by using the above photosensitive diamine monomer-containing resin. The present application can simultaneously improve the photosensitivity and film retention rate of the photosensitive resin composition. |
| priorityDate | 2022-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 116.