| abstract |
According to some embodiments herein, methods and apparatus for flowable deposition of thin films are described. Some embodiments herein relate to a cyclic process of gap filling in which deposition is followed by thermal annealing and repetition. In some embodiments, deposition and thermal annealing are performed in separate stations. In some embodiments, the second module is heated to a higher temperature than the first station. In some embodiments, the thermal annealing includes RTA. |