Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-332 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-303 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4554 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
filingDate |
2020-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2d3b27ecb0292cc12721d1c195654f7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2982129ce5a3ba94cc62f226a08d378a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7dd3dfd0df989c28f0c405ec738dfede http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e308aed26e50de41bd07e0fc06d3b787 |
publicationDate |
2022-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-114072540-A |
titleOfInvention |
Manufacturing method of semiconductor device, substrate processing apparatus and program |
abstract |
The present invention includes a film-forming step of forming a film containing a predetermined element and nitrogen on a substrate by performing a predetermined number of cycles including the following (a) to (c): (a) heating in the processing chamber until the first A step of forming a first layer by supplying a raw material gas containing a predetermined element and a halogen to a substrate at a temperature; (b) supplying a plasma-excited first reforming gas containing hydrogen and no nitrogen to the substrate in the processing chamber, so that The step of reforming the first layer to form the second layer; and (c) supplying a plasma-excited second reforming gas containing nitrogen and hydrogen to the substrate in the processing chamber to reform the second layer to form the third layer The step of layering, wherein the supply time TH of the first reforming gas in (b) is set to be longer than the supply time TN of the second reforming gas in (c). |
priorityDate |
2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |