| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2021-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e308aed26e50de41bd07e0fc06d3b787
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5336d19447a9d6c4c3bc33a8aea53863
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c5cd30b563e38e0b73e0142eee40882
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e64c1dd96d6bc751b4c1128fbbc22ca7 |
| publicationDate |
2021-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-113871288-A |
| titleOfInvention |
Manufacturing method of semiconductor device, substrate processing method, substrate processing apparatus, and recording medium |
| abstract |
The present application relates to a manufacturing method of a semiconductor device, a substrate processing method, a substrate processing apparatus, and a recording medium. By appropriately suppressing the generation of particles due to the film formed in the processing container, the cleaning cycle can be extended and the productivity of the film forming process can be improved. A group including the following steps is repeated a plurality of times: (a) a step of carrying a substrate into a processing container; (b) supplying a film-forming gas to a substrate supported by a support in the processing container to form nitrogen on the substrate The process of treating the chemical film; (c) the process of unloading the processed substrate from the processing container; (d) supplying an oxidizing gas into the processing container after the processed substrate is unloaded, and (b) in the A part of the nitride film formed in the processing container is oxidized and converted into an oxide film, and other parts of the nitride film different from the part are maintained in the state of a nitride film without being oxidized. |
| priorityDate |
2020-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |