| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7c5a4ae81822d214a07bf55ad61bd1cf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32119
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2020-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9049d551b4c2848ae3db4f4a0f055ab5 |
| publicationDate |
2021-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-113841218-A |
| titleOfInvention |
Plasma processing apparatus |
| abstract |
A plasma processing apparatus for performing vacuum processing on an object to be processed disposed in a processing chamber by using plasma, comprising: a container body having an opening in a wall forming the processing chamber; a metal plate provided so as to close the opening and having a slit formed therethrough in a thickness direction; a dielectric plate supported in contact with the metal plate and blocking the slit from an outside of the processing chamber; and an antenna provided outside the processing chamber so as to face the metal plate, and connected to a high-frequency power supply to generate a high-frequency magnetic field, wherein h-D/2 > 0.7(h is a distance (mm) between a center axis of the antenna and a surface of the metal plate on the antenna side, and D is a diameter (mm) of the antenna). |
| priorityDate |
2019-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |