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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
filingDate 2021-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2074654a604983ca9dec315ab73a052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d90cbc89fef1ad1d745689c4bf33a56
publicationDate 2021-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113451195-A
titleOfInvention Sheet for manufacturing semiconductor device and method for manufacturing sheet for manufacturing semiconductor device
abstract The present invention relates to a sheet for manufacturing a semiconductor device, comprising a substrate, a first adhesive layer, a film-like adhesive, a release film, a second adhesive layer, and a support substrate, wherein the substrate is sequentially laminated on the substrate. The first pressure-sensitive adhesive layer, the film-like pressure-sensitive adhesive, the release film, the second pressure-sensitive adhesive layer, and the support base material are formed, and the release film, the second pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are laminated in this order. The thickness of the composite release film of the structure of the adhesive layer and the support substrate is greater than 38 μm.
priorityDate 2020-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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