http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113380599-A

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filingDate 2021-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d817f745c7f23f9535e5b0201d131f3c
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publicationDate 2021-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113380599-A
titleOfInvention Plasma treatment method
abstract The present invention relates to a plasma treatment method. [Problem] Consumption of components in a chamber is suppressed and process stabilization is achieved. [Solution] A plasma processing method for performing plasma processing on a substrate, the plasma processing method including a step of plasmaizing a first gas containing carbon and hydrogen in a chamber , the step of coating the surface of the member in the chamber with the film having conductivity; the step of carrying the substrate into the chamber; and, in the state where the surface of the member in the chamber is coated with the film having conductivity, in A process of treating the substrate by plasma-forming the second gas in the chamber.
priorityDate 2020-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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