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filingDate 2019-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28966411de627e71a515c1fda361d974
publicationDate 2021-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-112640084-A
titleOfInvention Confinement rings with extended life
abstract A confinement ring for a substrate processing system includes a lower wall, an outer wall, and an upper wall that define a plasma region within the confinement ring. A first plurality of grooves are formed in the lower wall. The first plurality of grooves provide fluid communication between the plasma region within the confinement ring and the environment outside the confinement ring. A recess is defined in the lower surface of the lower wall. A lower ring is disposed within the recess of the lower surface. The lower ring includes a second plurality of grooves that provide communication between the plasma region within the confinement ring and the environment outside the confinement ring via the first plurality The fluid communication of the tank.
priorityDate 2018-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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