| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-10677 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2019-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de62f8d9ac05a88e9421baf65a88ab1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c89b01281ac87b5b3e0ef3f96f4e4181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6234bd67d56dd472bf96f86b44aa017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96ce915e37ee06bc793a50197ea5e091 |
| publicationDate |
2021-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-112640041-A |
| titleOfInvention |
Method for removing SnO2 film from chamber |
| abstract |
A method of removing SnO2 residues from a processing chamber is provided as an embodiment. The method embodiments include introducing hydrocarbon gas and hydrogen gas into the plasma processing system at a ratio of 1% to 60%. The plasma generated by the plasma source is utilized to etch the SnO2 residue from the surface of the processing chamber. The SnH 4 gas reacts with the hydrocarbon gas to generate volatile organotin compounds. The method also provides for evacuating the organotin compound from the processing chamber. Introducing the hydrocarbon gas together with the hydrogen gas at a ratio of 1% to 60% reduces the rate at which the SnH 4 gas is decomposed into Sn powder. |
| priorityDate |
2018-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |