| abstract |
A subwavelength surface nanostructure based on ion bombardment technology and a preparation method thereof, the preparation method comprises: coating a photoresist on a substrate, and curing to obtain a photoresist film sample; Ion beam bombardment forms subwavelength nanostructures on the surface of the photoresist; etching to remove the remaining photoresist on the bottom layer of the subwavelength nanostructures, and etching the photoresist film sample to the substrate to obtain subwavelength nanostructures The photoresist mask is obtained; the subwavelength nanostructure of the photoresist mask is transferred to the substrate, and the remaining photoresist mask after pattern transfer is removed to obtain the subwavelength surface nanostructure on the substrate. The invention utilizes the principle of inducing self-organized nanostructures on the solid surface by ion bombardment technology and combines with the mask etching method to prepare subwavelength surface nanostructures on the surfaces of various materials, and has the advantages of small feature size, simple process and high processing efficiency. Advantage. |