http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110959312-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2242-26 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32733 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 |
| filingDate | 2018-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a882a27a168c10d36ad3550e3d07489 |
| publicationDate | 2020-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-110959312-A |
| titleOfInvention | Plasma generating apparatus, substrate processing apparatus, and manufacturing method of semiconductor device |
| abstract | The present invention provides a technique including: a high-frequency power supply for supplying power to a plasma generating unit; a matching device provided between the high-frequency power supply and the plasma generating unit for obtaining the plasma generating unit The load resistance of the part is matched with the output resistance of the high-frequency power supply. The high-frequency power supply includes: a high-frequency oscillator, which oscillates to generate a high frequency; extracting a part of the traveling wave component from the above-mentioned high-frequency oscillator and the reflected wave component from the above-mentioned matching device; a filter for removing noise signals added to the above-mentioned reflected wave component extracted by the above-mentioned directional coupler; a power monitor , which measures the reflected wave component after passing through the filter and the traveling wave component extracted by the directional coupler, and performs feedback control on the matching device to reduce the reflected wave component from the matching device. |
| priorityDate | 2017-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.