Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ddb9f3656270bc5410be3679322fead |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-441 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-549 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-293 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42364 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K10-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-29 |
filingDate |
2013-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cddf33a3259cce5391f11ef5917d8c5b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4608198b5fe67fd762ef715ee6d8a50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78470068e2296018d7db5207078792a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfece6d9d4a32236c242d0dd437ed059 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d47dfd6aadd7a1c3093ebda6295a1bb |
publicationDate |
2019-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-110209014-A |
titleOfInvention |
Positive photosensitive composition, thin film transistor and compound |
abstract |
The present invention provides a positive-type photosensitive composition excellent in pattern formation properties and electrical insulation reliability of a cured product (film). The first positive-type photosensitive composition of the present invention comprises: or a SiH-based compound having a structure that decomposes in the presence of an acid to exhibit an acidic group or a hydroxyl group; (B) a compound containing a SiH group or an alkenyl group in one molecule; (C) a hydrosilylation catalyst; and (D) Photoacid generator. |
priorityDate |
2012-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |