http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110036460-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2017-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d7422e268f9bffa99f0f8ee91bfe94f
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publicationDate 2019-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110036460-A
titleOfInvention Dry etchant composition and dry etching method
abstract The invention discloses a dry etchant composition and an invention using the same. The dry etchant composition contains 1,3,3,3-tetrafluoropropene, CH x C y F z (x, y, z is an integer greater than or equal to 1, and x+y+z=4) a hydrochlorofluorocarbon, and the concentration of the above-mentioned hydrochlorofluorocarbon relative to 1,3,3,3-tetrafluoropropene is 3 ppm by volume More than and less than 10000 volume ppm. The purpose of the present invention is to improve the storage stability of HFO-1234ze in the semiconductor manufacturing process without sacrificing the good etching properties of HFO-1234ze, suppress the generation of acidic substances, and prevent storage containers, piping, and etching chambers. corrosion.
priorityDate 2016-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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