http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109856706-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2019-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109856706-B |
| titleOfInvention | Method for manufacturing quartz surface anti-reflection layer by using metal-induced self-mask etching process |
| abstract | The present disclosure provides a method for fabricating a quartz surface anti-reflection layer using a metal induced self-mask etching process, comprising: step S100, etching a metal material and a quartz substrate by utilizing a mixed gas reactive ion containing fluorine-based gas, and sputtering metal on the surface of quartz to form a non-volatile metal fluoride; step S200, the etching product fluorocarbon polymer is gathered around the metal fluoride to form a micro mask; and step S300, simultaneously etching the micro mask and the quartz substrate to form the sub-wavelength structure anti-reflection layer. According to the micro-mask, the metal is sputtered on the quartz surface to form the non-volatile metal fluoride, so that the etching resistance of the micro-mask is improved, a deeper sub-wavelength structure can be obtained on the quartz surface, the requirement of an anti-reflection layer can be met, meanwhile, the manufacturing process is simple, the cost is low, the large-area manufacturing can be realized rapidly, and the wide application is facilitated. |
| priorityDate | 2019-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 46.