http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109767980-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccf5b9bc19312664d96f9082d4c635b6 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2019-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ae0bb57f1ea5b5743ace9b1fae6ee88 |
| publicationDate | 2019-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109767980-A |
| titleOfInvention | Super junction and its manufacturing method, deep trench manufacturing method of super junction |
| abstract | The present invention provides a super junction and a method for fabricating the same, a method for fabricating a deep trench in a super junction, and a method for fabricating a deep trench in a super junction, which is formed on a substrate or formed in a substrate by a high molecular polymer gas pair. The mask layer on the epitaxial layer is etched to form a hard mask plate, and the substrate or the epitaxial layer formed on the substrate is etched step by step through the hard mask plate with stepwise increasing gas pressure to The substrate or the epitaxial layers of the substrate are formed to form deep trenches. The present invention can form deep trenches with better feature size uniformity, better depth uniformity and better angle uniformity. |
| priorityDate | 2019-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.