http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109701513-A

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filingDate 2018-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7c69ff7e9f7665be7331267404a5c70
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publicationDate 2019-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109701513-A
titleOfInvention A kind of batch preparation method of photocatalyst degradation of explosive waste water
abstract The present invention relates to a preparation method of batch nanometer photocatalytic material. With the aid of a rotating bed atomic layer deposition system, the method can realize the loading of different nano-photocatalytic materials on the surface of micro/nano carbon substrate materials with high specific surface area in large quantities, which can be used for the degradation of explosive waste water. A quartz crystal microbalance was used to study the growth process of atomic layer deposition nano-photocatalytic materials, and the saturated atomic layer deposition timing conditions of rotating bed atomic deposition on the surface of different substrate materials with different photocatalytic materials were determined by experiments, and repeated many times under the optimal reaction conditions. cycle until the micro/nano carbon-based photocatalytic material with the required loading amount is generated. The photocatalyst prepared by rotating bed atomic layer deposition has the advantages of high dispersion, uniform distribution of inner and outer surfaces, and precise and controllable loading capacity, and exhibits high activity and stability in catalytic reactions. In addition, the method has the advantages of high automation, simple operation and mass production.
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