http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109599460-A

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filingDate 2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_814bd6a18d09dedfe073213a2f392d13
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publicationDate 2019-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109599460-A
titleOfInvention A kind of manufacturing method of compound back surface field space GaInP/GaInAs/Ge battery epitaxial wafer
abstract The invention discloses a manufacturing method of a compound back surface field space GaInP/GaInAs/Ge battery epitaxial wafer, which optimizes the back surface field layer in the conventional space lattice matching GaInP/GaInAs/Ge battery, that is: the space lattice of the present invention The middle cell and top cell in the matching GaInP/InGaAs/Ge cell are respectively introduced with a composite back surface field structure, the middle cell is Al 0.3 Ga 0.7 As/Ga 0.5 In 0.5 P composite back surface field structure, and the top cell is Al 0.33 Ga 0.15 In 0.52 P /Al 0.1 Ga 0.4 In 0.5 P composite back surface field structure. Through the design of the composition and concentration of each layer of the compound back surface field, the conduction band step and concentration gradient are formed in the back surface field, so that the electric field between the back surface field and the base area is strengthened, so that the photogenerated carriers generated in the base region of the battery reach the back surface field. The reflection efficiency is improved, and the minority carriers are better collected, thereby improving the photoelectric conversion efficiency of the battery.
priorityDate 2018-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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