http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109315070-A

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filingDate 2017-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_055732915e1e00d400adce84a0173adf
publicationDate 2019-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109315070-A
titleOfInvention Manufacturing method of multilayer substrate
abstract The manufacturing method of a multilayer substrate includes a preparation process, a filling process, and 1st, 2nd, and 3rd formation processes. The preparation step prepares an insulating base material (12) having a conductor pattern (18) formed on one side thereof. At this time, the conductor pattern (18) is made of Cu element. In addition, a Ni layer (16) is formed on the surface of the conductor pattern (18) on the side of the insulating base material (12). In the first forming step, a via hole (20) having a conductor pattern (18) as a bottom (20a) is formed in the insulating base material (12). At this time, the Ni layer ( 16 ) located in the range to be the bottom ( 20 a ) is removed. The filling step fills the conductive paste (22) into the inside of the via hole (20). In the second forming step, a laminate (24) is formed by stacking a plurality of insulating base materials (12). In the third forming step, the laminated body (24) is heated while being pressurized. Thereby, in the manufacturing method of a multilayer substrate, a plurality of insulating base materials (12) are integrated to form conductive holes (26). At this time, a diffusion layer (24) containing the metal element and the Cu element in the conductive paste (22) is formed between the conductive pattern (28) and the conductive hole (26).
priorityDate 2016-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.