http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109153886-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2016-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109153886-B |
| titleOfInvention | Use of chemical mechanical polishing (CMP) compositions for polishing substrates comprising cobalt and/or cobalt alloys |
| abstract | The present invention relates to the use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises : (A) inorganic particles, (B) anionic surfactant of general formula (I): R-S, wherein R is C 5 -C 20 alkyl, C 5 - C 20 alkenyl, C 5 - C 20 Alkyl acyl or C 5 -C 20 alkenyl acyl, and S is a sulfonic acid derivative, an amino acid derivative or a phosphoric acid derivative or a salt or mixture thereof, (C) at least one amino acid, (D) at least one oxidizing agent , (E) an aqueous medium, wherein the pH of the CMP composition (Q) is 7 to 10. |
| priorityDate | 2016-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 97.