| abstract |
The present invention provides a gas barrier film with high barrier properties even in high temperature and high humidity environment and its manufacturing method. The gas barrier film sequentially includes a film substrate, an organic layer, and a silicon dioxide layer. The silicon dioxide layer contains a silicon dioxide polymer having at least a covalent bond between silicon atoms and oxygen atoms, and the carbon atoms in the organic layer The concentration is above 50%. A method for producing a gas barrier film, wherein an organic layer having a carbon atom concentration of 50% or more is formed on a film substrate, and a coating liquid containing a silicon compound is coated on the organic layer to form a layer containing the silicon compound , irradiating the layer containing the silicon compound with vacuum ultraviolet rays to form a silicon dioxide layer containing silicon dioxide polymers having at least a covalent bond between silicon atoms and oxygen atoms. |