http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108368214-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-12 |
| filingDate | 2016-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-108368214-B |
| titleOfInvention | Novolak resin and resist film |
| abstract | Provided are novolak-type resins excellent in developability, heat resistance, and dry etching resistance, and photosensitive compositions, curable compositions, and resist films containing the same. A novolak-type resin characterized by having the following structural formula (1) or (2) [wherein Ar represents an arylene group. R 1 is each independently any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, and m is each independently an integer of 1 to 3. X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a heteroatom-containing cyclic hydrocarbon group, and a trialkylsilyl group. ] as a repeating unit, and at least one of X present in the resin is a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a heteroatom-containing cyclic hydrocarbon group, a trialkylsilane any of the bases. |
| priorityDate | 2015-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 684.