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filingDate 2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107195616-B
titleOfInvention Semiconductor device including metal adhesion and barrier structures and method of forming the same
abstract Semiconductor devices including metal adhesion and barrier structures and methods of forming the same are disclosed. Embodiments of a semiconductor device include a metal structure electrically connected to a semiconductor body. The metal adhesion and barrier structure is located between the metal structure and the semiconductor body. The metal adhesion and barrier structure includes a layer comprising titanium and tungsten, and a layer comprising titanium, tungsten, and nitrogen over the layer comprising titanium and tungsten.
priorityDate 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 31.