http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105895519-B

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105895519-B
titleOfInvention Residue-free system and method for isotropic etching of silicon in tight spaces
abstract The present invention relates to a residue-free system and method for isotropically etching silicon in tight spaces. A system and method for etching a substrate includes disposing a substrate including a first structure and a dummy structure in a processing chamber. The first structure is made of a material selected from the group consisting of silicon dioxide and silicon nitride. The dummy structure is made of silicon. A carrier gas is supplied to the processing chamber. The nitrogen trifluoride and hydrogen molecular gases are supplied to the processing chamber. Plasma is energized in the processing chamber. The dummy structures are etched.
priorityDate 2015-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8679982-B2
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457765275
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID784
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523397
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24553
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412584819
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1118

Total number of triples: 36.