http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104465365-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3457 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2014-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104465365-B |
| titleOfInvention | Method of plasma processing |
| abstract | The method of plasma processing that aspect ratio shape high can be formed with high etch rates is provided, the method includes：Etching work procedure, will contain SF 6 、ClF 3 And F 2 In at least one first gas be supplied in treatment vessel, the plasma for generating first gas is etched to being of target objects by etched layer；First film formation process; at least one second gas in containing hydrocarbon, fluorocarbon and fluorohydrocarbon are supplied in treatment vessel, the plasma for generating second gas to be formed at least a portion of etched layer origin in the diaphragm of second gas.In etching work procedure, the pressure in treatment vessel is set to first pressure and the first bias power is applied to lower electrode.In the first film formation process, by the pressure in treatment vessel be set below first pressure second pressure and to lower electrode apply higher than the first bias power the second bias power.Repeat the sequence including etching work procedure and the first film formation process. |
| priorityDate | 2013-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411556313 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11638 |
Total number of triples: 17.